Pattern transfer of hexagonal packed structure via ultrathin metal nanomesh masks for formation of Si nanopore arrays
详细信息 查看全文
- 作者：Zeping Li
- 关键词：Pattern transfer ; AAO ; Metal nanomesh ; PMMA ; Si nanopore arrays
- 刊名：Journal of Alloys and Compounds
- 出版年：2017
- 出版时间：25 February 2017
- 年：2017
- 卷：695
- 期：Complete
- 页码：458-461
- 全文大小：1125 K
- 卷排序：695
文摘
A method for ultrathin Au nanomesh assisted in transferring AAO pattern is proposed. Au nanomesh keeps a close contact to Si substrate through the sacrificial PMMA layer. The problem that high aspect ratio AAO is not suitable for as etching mask is solved. This technology improves the pattern fidelity and reduces defects.