Reactive high-rate deposition of titanium oxide coatings using electron beam evaporation, spotless arc and dual crucible
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- 作者：Bert Scheffel ; bert.scheffel@fep.fraunhofer.de" class="auth_mail" title="E-mail the corresponding author ; Thomas Modes thomas.modes@fep.fraunhofer.de" class="auth_mail" title="E-mail the corresponding author ; Christoph Metzner christoph.metzner@fep.fraunhofer.de" class="auth_mail" title="E-mail the corresponding author
- 关键词：Electron beam ; Titanium dioxide ; Titania thin film ; Spotless arc ; Plasma activated ; Anatase
- 刊名：Surface and Coatings Technology
- 出版年：2016
- 出版时间：15 February 2016
- 年：2016
- 卷：287
- 期：Complete
- 页码：138-144
- 全文大小：1190 K
文摘
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High-rate electron beam evaporation was combined with a spotless arc for plasma-asssisted thin film deposition.
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The spotless arc burns between two molten titanium electrodes.
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TiOx layers were deposited at a very high deposition rate (approximately 50 to 100 nm/s).
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Amorphous as well as anatase-form crystalline TiO2 layers were produced.
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Transparent amorphous layers with a high refractive index (2.4) were produced.