Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography

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• 作者：Jun Zhao^a ; Yanqing Wu^a ; ^{wuyanqing@sinap.ac.cn} ; Chaofan Xue^a ; ^{xuechaofan@sinap.ac.cn} ; Shumin Yang^a ; Liansheng Wang^a ; Fangyuan Zhu^a ; Zhichao Zhu^b ; Bo Liu^b ; Yong Wang^a ; Renzhong Tai^a ; ^{tairenzhong@sinap.ac.cn}
• 关键词：Periodic structures ; Scintillator ; Soft X-ray interference lithography ; High aspect ratio
• 刊名：Microelectronic Engineering
• 出版年：2017
• 出版时间：25 February 2017
• 年：2017
• 卷：170
• 期：Complete
• 页码：49-53
• 全文大小：783 K
• 卷排序：170

文摘

Soft X-ray interference lithography (SXIL) is developed in SSRF. The relationship between the transmission rate and the exposed profile is analyzed. A Perm alloy photon stop layer is used to improve the service life of grating mask. SXIL has been used in the high efficiency radiation detector research field.