Direct Photolithography of Perfluoropolyethers for Solvent-Resistant Microfluidics

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• 作者：Alessandra Vitale ; Marzia Quaglio ; Simone L. Marasso ; Angelica Chiodoni ; Matteo Cocuzza ; Roberta Bongiovanni
• 刊名：Langmuir
• 出版年：2013
• 出版时间：December 17, 2013
• 年：2013
• 卷：29
• 期：50
• 页码：15711-15718
• 全文大小：439K
• 年卷期：v.29,no.50(December 17, 2013)
• ISSN：1520-5827

文摘

In this work, photocurable perfluoropolyethers (PFPEs) have been used for the fabrication of microfluidic devices by a direct photolithographic process. During this mask-assisted photopolymerization technique, the material is directly photopolymerized in the presence of a mask, avoiding the use of a master. We demonstrate the high level of control in transferring micropattern features with high density, a minimum transferred size of 15 渭m, a high aspect ratio (at least up to 6.5), and complex shapes useful for microfluidic applications. Moreover, we successfully apply this technology to fabricate sealed devices; the fabrication time scale for the overall process is around 5 min. The devices are able to withstand a flow pressure of up to 3.8 bar, as required for most microfluidics. Finally, the devices are tested with a model reaction employing organic solvents.