Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate

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• 作者：Thomas Dobbelaere ; Amit K. Roy ; Philippe Vereecken ; Christophe Detavernier
• 刊名：Chemistry of Materials
• 出版年：2014
• 出版时间：December 9, 2014
• 年：2014
• 卷：26
• 期：23
• 页码：6863-6871
• 全文大小：537K
• ISSN：1520-5002

文摘

Aluminum phosphate thin films were deposited by plasma-assisted atomic layer deposition (ALD) using a sequence of trimethyl phosphate (TMP, Me₃PO₄) plasma, O₂ plasma, and trimethylaluminum (TMA, Me₃Al) exposures. In situ characterization was performed, including spectroscopic ellipsometry, optical emission spectroscopy, mass spectrometry and FTIR. In the investigated temperature region between 50 and 320 掳C, nucleation delays were absent and linear growth was observed, with the growth per cycle (GPC) being strongly dependent on temperature. The plasma polymerization of TMP was found to play an important role in this process, resulting in CVD-like behavior at low temperatures and ALD-like behavior at high temperatures. Films grown at 320 掳C had a GPC value of 0.37 nm/cycle and consisted of amorphous aluminum pyrophosphate (Al₄P₆O₂₁). They could be crystallized to triclinic AlPO₄ (tridymite) by annealing to 900 掳C, as evidenced by high-temperature XRD measurements. The use of a TMP plasma might open up the possibility of depositing many other metal phosphates by combining it with appropriate organometallic precursors.