Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers

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• 作者：Anne-Marije Andringa ; Alberto Perrotta ; Koen de Peuter ; Harm C. M. Knoops ; Wilhelmus M. M. Kessels ; Mariadriana Creatore
• 刊名：ACS Applied Materials & Interfaces
• 出版年：2015
• 出版时间：October 14, 2015
• 年：2015
• 卷：7
• 期：40
• 页码：22525-22532
• 全文大小：367K
• ISSN：1944-8252

文摘

Encapsulation of organic (opto-)electronic devices, such as organic light-emitting diodes (OLEDs), photovoltaic cells, and field-effect transistors, is required to minimize device degradation induced by moisture and oxygen ingress. SiN_x moisture permeation barriers have been fabricated using a very recently developed low-temperature plasma-assisted atomic layer deposition (ALD) approach, consisting of half-reactions of the substrate with the precursor SiH₂(NH^tBu)₂ and with N₂-fed plasma. The deposited films have been characterized in terms of their refractive index and chemical composition by spectroscopic ellipsometry (SE), X-ray photoelectron spectroscopy (XPS), and Fourier-transform infrared spectroscopy (FTIR). The SiN_x thin-film refractive index ranges from 1.80 to 1.90 for films deposited at 80 掳C up to 200 掳C, respectively, and the C, O, and H impurity levels decrease when the deposition temperature increases. The relative open porosity content of the layers has been studied by means of multisolvent ellipsometric porosimetry (EP), adopting three solvents with different kinetic diameters: water (鈭?.3 nm), ethanol (鈭?.4 nm), and toluene (鈭?.6 nm). Irrespective of the deposition temperature, and hence the impurity content in the SiN_x films, no uptake of any adsorptive has been observed, pointing to the absence of open pores larger than 0.3 nm in diameter. Instead, multilayer development has been observed, leading to type II isotherms that, according to the IUPAC classification, are characteristic of nonporous layers. The calcium test has been performed in a climate chamber at 20 掳C and 50% relative humidity to determine the intrinsic water vapor transmission rate (WVTR) of SiN_x barriers deposited at 120 掳C. Intrinsic WVTR values in the range of 10^鈥? g/m²/day indicate excellent barrier properties for ALD SiN_x layers as thin as 10 nm, competing with that of state-of-the-art plasma-enhanced chemical vapor-deposited SiN_x layers of a few hundred nanometers in thickness.