Thermal desorption spectroscopy is employed to examine transport mechanisms in structured, nanoscale filmsconsisting of labeled amorphous solid water (ASW, H
218O, H
216O) and organic spacer layers (CCl
4, CHCl
3)prior to ASW crystallization (
T ![](/images/entities/ap.gif)
150-160 K). Self-transport is studied as a function of both the ASW layerand the organic spacer layer film thickness, and the effectiveness of these spacer layers as a bulk diffusion"barrier" is also investigated. Isothermal desorption measurements of structured films are combined with gasuptake measurements (CClF
2H) to investigate water self-transport and changes in ASW film morphologyduring crystallization and annealing. CCl
4 desorption is employed as a means to investigate the effects ofASW film thickness and heating schedule on vapor-phase transport. Combined, these results demonstratethat the interlayer mixing observed near
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150-160 K is inconsistent with a mechanism involving diffusionthrough a dense phase; rather, we propose that intermixing occurs via vapor-phase transport through aninterconnected network of cracks/fractures created within the ASW film during crystallization. Consequently,the self-diffusivity of ASW prior to crystallization (
T ![](/images/entities/ap.gif)
150-160 K) is significantly smaller than that expectedfor a "fragile" liquid, indicating that water undergoes
either a glass transition
or a fragile-to-strong transitionat a temperature above 160 K.