Functionalization of Silica Nanoparticles and Native Silicon Oxide with Tailored Boron-Molecular Precursors for Efficient and Predictive p-Doping of Silicon
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- 作者：Laurent Mathey ; Thibault Alphazan ; Maxence Valla ; Laurent Veyre ; Herv茅 Fontaine ; Virginie Enyedi ; Karim Yckache ; Marianne Danielou ; S茅bastien Kerdiles ; Jean Guerrero ; Jean-Paul Barnes ; Marc Veillerot ; Nicolas Chevalier ; Denis Mariolle ; Fran莽ois Bertin ; Corentin Durand ; Maxime Berthe ; Jolien Dendooven ; Fran莽ois Martin ; Chlo茅 Thieuleux ; Bruno Grandidier ; Christophe Cop茅ret
- 刊名：Journal of Physical Chemistry C
- 出版年：2015
- 出版时间：June 18, 2015
- 年：2015
- 卷：119
- 期：24
- 页码：13750-13757
- 全文大小：432K
- ISSN：1932-7455
文摘
Designing new approaches to incorporate dopant impurities in semiconductor materials is essential in keeping pace with electronics miniaturization without device performance degradation. On the basis of a mild solution-phase synthetic approach to functionalize silica nanoparticles, we were able to graft tailor-made boron-molecular precursors and control the thermal release of boron in the silica framework. The molecular-level description of the surface structure lays the foundation for a structure鈥損roperty relationship approach, which is readily and successfully implemented to dope non-deglazed silicon wafers. As the method does not require an additional oxide capping step and shows minimal risk of carbon contamination, as demonstrated by compositional and electrical characterizations of the wafers, it is perfectly adapted to advanced microelectronics manufacturing processes.