X-ray/Atomic Force Microscopy Study of the Temperature-Dependent Multilayer Structure of PTCDI-C8 Films on SiO2
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- 作者：Tobias N. Krauss† ; ; Esther Barrena*† ; ‡ ; ; Dimas G. de Oteyza† ; ; Xue N. Zhang† ; ; Jnos Major† ; ; Volker Dehm
- 刊名：Journal of Physical Chemistry C
- 出版年：2009
- 出版时间：March 19, 2009
- 年：2009
- 卷：113
- 期：11
- 页码：4502-4506
- 全文大小：291K
- 年卷期：v.113,no.11(March 19, 2009)
- ISSN：1932-7455
文摘
Combining atomic force microscopy, X-ray specular reflection, and grazing incidence X-ray diffraction experiments provides a thorough characterization of the structural properties of PTCDI-C8 films on native silicon dioxide as a function of both growth and post-annealing temperatures. We disclose that monomolecular islands and terraces are polycrystalline with lateral sizes of only 280 Å. While the lateral size of the crystallites remains unaffected by an increase of the growth temperature, the ordering along the surface normal is greatly enhanced, thereby reducing the density of topographical grain boundaries. Similarly, optimal post-annealing temperatures cause a better vertical ordering of the multilayer. From a detailed analysis of the X-ray reflectivity as obtained for the best ordered film, we provide accurate information on the vertical structure in the thin film and determine the tilt of the perylene cores.