Surface Hydride Composition of Plasma-Synthesized Si Nanoparticles
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文摘
We have determined the surface hydride composition of amorphous and crystalline Si nanoparticles (NPs) (3鈥? nm) synthesized in a low-temperature SiH4/Ar plasma using in situ attenuated total reflection Fourier-transform infrared spectroscopy and H2 thermal effusion measurements. With increasing power to the plasma source, the particles transition from amorphous to crystalline with a corresponding increase in the fraction of SiH species on the surface. The surface hydride composition indicates that Si NPs synthesized at higher plasma powers crystallize in the gas-phase due to a greater degree of plasma-induced heating, which enhances the desorption rates for SiH2 and SiH3. Furthermore, these Si NPs do not contain any detectable H in the bulk.

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