Controlling the Orientation, Edge Geometry, and Thickness of Chemical Vapor Deposition Graphene
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- 作者：Adrian T. Murdock ; Antal Koos ; T. Ben Britton ; Lothar Houben ; Tim Batten ; Tong Zhang ; Angus J. Wilkinson ; Rafal E. Dunin-Borkowski ; Christina E. Lekka ; Nicole Grobert
- 刊名：ACS Nano
- 出版年：2013
- 出版时间：February 26, 2013
- 年：2013
- 卷：7
- 期：2
- 页码：1351-1359
- 全文大小：907K
- 年卷期：v.7,no.2(February 26, 2013)
- ISSN：1936-086X
文摘
We report that the shape, orientation, edge geometry, and thickness of chemical vapor deposition graphene domains can be controlled by the crystallographic orientations of Cu substrates. Under low-pressure conditions, single-layer graphene domains align with zigzag edges parallel to a single 101 direction on Cu(111) and Cu(101), while bilayer domains align to two directions on Cu(001). Under atmospheric pressure conditions, hexagonal domains also preferentially align. This discovery can be exploited to generate high-quality, tailored graphene with controlled domain thickness, orientations, edge geometries, and grain boundaries.