Alucone Alloys with Tunable Properties Using Alucone Molecular Layer Deposition and Al2O3 Atomic Layer Deposition

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• 作者：Byoung H. Lee ; Byunghoon Yoon ; Virginia R. Anderson ; Steven M. George
• 刊名：The Journal of Physical Chemistry C
• 出版年：2012
• 出版时间：February 9, 2012
• 年：2012
• 卷：116
• 期：5
• 页码：3250-3257
• 全文大小：516K
• 年卷期：v.116,no.5(February 9, 2012)
• ISSN：1932-7455

文摘

Ultrathin and conformal hybrid organic鈥搃norganic thin films can be deposited by molecular layer deposition (MLD) techniques. By combining the hybrid organic鈥搃norganic MLD process with an inorganic atomic layer deposition (ALD) process, ALD/MLD alloy films can be deposited that have an adjustable organic鈥搃norganic composition. These alloys have tunable properties that may be useful for designing various functional films. In this study, alucone MLD using trimethylaluminum (TMA) and ethylene glycol (EG) was employed together with Al₂O₃ ALD using TMA and H₂O to deposit alucone alloys at 135 掳C. The surface species and film growth were examined using in situ Fourier transform infrared spectroscopy. The mass gain for each reactant exposure during film growth was also monitored using an in situ quartz crystal microbalance (QCM) in a viscous flow reactor. The composition of the alucone alloy was varied by adjusting the relative number of ALD and MLD cycles in the reaction sequence. Alucone alloys were grown using relative numbers of ALD and MLD cycles varying from 1:3 to 6:1 (TMA/H₂O:TMA/EG). These alucone alloys displayed varying density, refractive index, elastic modulus, and hardness. The density and refractive index changed from 1.6 g/cm³ and n = 1.45 for pure alucone to 3.0 g/cm³ and n = 1.64 for pure Al₂O₃, respectively. The elastic modulus and hardness varied from 21 卤 8 GPa and 1.0 卤 0.1 GPa for pure alucone to 198 卤 8 GPa and 13.0 卤 0.2 GPa for pure Al₂O₃, respectively. These results demonstrate the potential of ALD/MLD alloy films to provide tunable properties for many functional film applications.