Metal Carbonyl Vapor Generation Coupled with Dielectric Barrier Discharge To Avoid Plasma Quench for Optical Emission Spectrometry

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• 作者：Yi Cai ; Shao-Hua Li ; Shuai Dou ; Yong-Liang Yu ; Jian-Hua Wang
• 刊名：Analytical Chemistry
• 出版年：2015
• 出版时间：January 20, 2015
• 年：2015
• 卷：87
• 期：2
• 页码：1366-1372
• 全文大小：355K
• ISSN：1520-6882

文摘

The scope of dielectric barrier discharge (DBD) microplasma as a radiation source for optical emission spectrometry (OES) is extended by nickel carbonyl vapor generation. We proved that metal carbonyl completely avoids the extinguishing of plasma, and it is much more suitable for matching the DBD excitation and OES detection with respect to significant DBD quenching by concomitant hydrogen when hydride generation is used. A concentric quartz UV reactor allows sample solution to flow through the central channel wherein to efficiently receive the uniformly distributed UV irradiation in the confined cylindrical space between the concentric tubes, which facilitates effective carbonyl generation in a nickel solution. The carbonyl is transferred into the DBD excitation chamber by an argon stream for nickel excitation, and the characteristic emission of nickel at 232.0 nm is detected by a charge-coupled device (CCD) spectrometer. A 1.0 mL sample solution results in a linear range of 5鈥?00 渭g L^鈥? along with a detection limit of 1.3 渭g L^鈥? and a precision of 2.4% RSD at 50 渭g L^鈥?. The present DBD鈥揙ES system is validated by nickel in certified reference materials.