Effect of Temperature, Elevated Carbon Dioxide, and Drought during Seed Development on the Isoflavone Content of Dwarf Soybean [Glycine max (L.) Merrill] Grown in Controlled Environments
详细信息    查看全文
  • 作者:Charles R. Caldwell ; Steven J. Britz ; and Roman M. Mirecki
  • 刊名:Journal of Agricultural and Food Chemistry
  • 出版年:2005
  • 出版时间:February 23, 2005
  • 年:2005
  • 卷:53
  • 期:4
  • 页码:1125 - 1129
  • 全文大小:86K
  • 年卷期:v.53,no.4(February 23, 2005)
  • ISSN:1520-5118
文摘
The effects of elevated temperature, carbon dioxide, and water stress on the isoflavone content ofseed from a dwarf soybean line [Glycine max (L.) Merrill] were determined, using controlled environment chambers. Increasing the temperature from 18 C during seed development to 23 C decreasedtotal isoflavone content by about 65%. A further 5 C increase to 28 C decreased the total isoflavonecontent by about 90%. Combining treatments at elevated temperature with elevated CO2 (700 ppm)and water stress to determine the possible consequences of global climate change on soybean seedisoflavone content indicated that elevated CO2 at elevated temperatures could partially reverse theeffects of temperature on soybean seed isoflavone content. The addition of drought stress to plantsgrown at 23 C and elevated CO2 returned the total isoflavone levels to the control values obtainedat 18 C and 400 ppm CO2. The promotive effects of drought and elevated CO2 at 23 C on the6' '-O-malonygenistin and genistin levels were additive. The individual isoflavones often had differentresponses to the various growth conditions during seed maturation, modifying the proportions of theprincipal isoflavones. Therefore, subtle changes in certain environmental factors may change theisoflavone content of commercially grown soybean, altering the nutritional values of soy products.Keywords: Carbon dioxide; drought; global climate change; Glycine max (L.) Merrill; isoflavone;soybean

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700