Aqueous Solutions for Low-Temperature Photoannealing of Functional Oxide Films: Reaching the 400 掳C Si-Technology Integration Barrier

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• 作者：Christopher De Dobbelaere ; Maria Lourdes Calzada ; Ricardo Jim茅nez ; Jes煤s Ricote ; I帽igo Bretos ; Jules Mullens ; An Hardy ; Marlies K. Van Bael
• 刊名：Journal of the American Chemical Society
• 出版年：2011
• 出版时间：August 24, 2011
• 年：2011
• 卷：133
• 期：33
• 页码：12922-12925
• 全文大小：784K
• 年卷期：v.133,no.33(August 24, 2011)
• ISSN：1520-5126

文摘

Functional oxide films were obtained at low temperature by combination of aqueous precursors and a UV-assisted annealing process (aqueous photochemical solution deposition). For a PbTiO₃ model system, functional ferroelectric perovskite films were prepared at only 400 掳C, a temperature compatible with the current Si-technology demands. Intrinsically photosensitive and environmentally friendly aqueous precursors can be prepared for most of the functional multimetal oxides, as additionally demonstrated here for multiferroic BiFeO₃, yielding virtually unlimited possibilities for this low-temperature fabrication technology.