Polybenzoxazine as a Mold-Release Agent for Nanoimprint Lithography

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• 作者：Chih-Feng Wang ; Shih-Feng Chiou ; Fu-Hsiang Ko ; Jem-Kun Chen ; Cheng-Tung Chou ; Chih-Feng Huang ; Shiao-Wei Kuo ; Feng-Chih Chang
• 刊名：Langmuir
• 出版年：2007
• 出版时间：May 22, 2007
• 年：2007
• 卷：23
• 期：11
• 页码：5868 - 5871
• 全文大小：315K
• 年卷期：v.23,no.11(May 22, 2007)
• ISSN：1520-5827

文摘

One of the most important tasks remaining to be resolved in nanoimprint lithography is the elimination of the resiststicking to the mold during demolding. Previously, the main approach was to apply a thin layer of fluorinated alkylsilane mold-release agent on the surface on the mold; however, this involves complicated steps and high costs. Thelow surface free energy material polybenzoxazine provides an efficient mold-release agent for silicon molds that iseasier to process, costs less, and has no side reactions.