Orientation-Controlled Growth of Pt Films on SrTiO3 (001) by Atomic Layer Deposition
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文摘
We grew Pt films on TiO2-terminated SrTiO3 (001) by atomic layer deposition, using trimethyl(methylcyclopentadienyl)-platinum(IV) as the Pt source and O2 and O3 as the oxidants. The orientation of the Pt films grown with O2 varied from (111) to (001) as the growth temperature was increased from 220 to 350 掳C, while the Pt films grown with O3 have a strong preference for the (111) orientation even at a high growth temperature of 350 掳C. The difference in the orientation of the Pt films on SrTiO3 (001) was attributed to changes in the degree of chemical bonding across the Pt/SrTiO3 interface with respect to the oxidant. We observed an increase in Pt鈥揙 bonding at the interface between the Pt grown with O3 and the SrTiO3 substrate. The interfacial energy of Pt (111)鈭rTiO3 (001) may have been significantly decreased by the increase in Pt鈥揙 bonding at the interface, which eventually led to the strong (111) preference of the Pt grown with O3. The findings provide the possibility of controlling the orientation of Pt without manipulating the kinetic energy of crystal growth.

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