Reducing Substrate Pinning of Block Copolymer Microdomains with a Buffer Layer of Polymer Brushes

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• 作者：Christopher Harrison ; Paul M. Chaikin ; David A. Huse ; Richard A. Register ; Douglas H. Adamson ; Abishai Daniel ; E. Huang ; P. Mansky ; T. P. Russell ; Craig J. Hawker ; David A. Egolf ; Ilarion V. Melnikov
• 刊名：Macromolecules
• 出版年：2000
• 出版时间：February 8, 2000
• 年：2000
• 卷：33
• 期：3
• 页码：857 - 865
• 全文大小：595K
• 年卷期：v.33,no.3(February 8, 2000)
• ISSN：1520-5835

文摘

We study the range of orientational order of a single layer of cylindrical block copolymermicrodomains annealed on several types of substrates. The orientational persistence length or nematiccorrelation length (mages/gifchars/xi.gif" BORDER=0 >) is evaluated using recently developed imaging and analysis methods to measurethe grain size of the block copolymer microdomains. We show that the substrate can lower mages/gifchars/xi.gif" BORDER=0 > for blockcopolymers with a majority component that interacts strongly with the substrate, but this can be mitigatedby attaching a buffer layer of polystyrene brushes to the substrate. In addition, we show that, for a blockcopolymer where the block that strongly interacts with the substrate is the minority component, themicrodomain correlation length does not increase when substrates are treated with this buffer layer. Wesuggest that in this case the brushes do not increase mages/gifchars/xi.gif" BORDER=0 > not only because of the lower volume fraction ofthe strongly interacting component but also because there are block copolymer wetting layers at the freeand substrate interfaces that decouple the microdomains from the substrate in a similar manner as thepolystyrene brushes.