TiO
2, Al
2O
3, and ZrO
2 patterns (or masks) composed of ordered nanomotifs of various morphologies(i.e., perforations (craters), rings, canyons, wires, dots, or channels) with typical lateral dimensions of<40 nm and thicknesses below 15 nm are presented. They were simply prepared by chemical solutiondeposition (CSD) of molecular inorganic precursors and commercial block copolymers on bare orhydrophobised silicon wafer surfaces. The various nanostructures are obtained by self-assembly duringevaporation and are subsequently stabilized at 500
C. Compared to other techniques for surfacenanopatterning, the present method has the advantage of being cheap, reproducible, and easy to scale upand does not require specialized equipment. The type, dimension, and organization of these motifs wereassessed by AFM, FE-SEM, spectroscopic ellipsometry, and GI-SAXS and are shown to depend on theconditions of preparation. We show that the critical parameters for controlling the nanopatterncharacteristics are the organic to inorganic ratio, the solvent composition, the substrate surface energy,the evaporation temperature, and the quantity of initial solution deposited on the substrate. XPSinvestigation was used to access the chemical composition of the nanopatterns on the SiO
2 surface.