Facile Image Patterning via Sequential Thiol鈥揗ichael/Thiol鈥揧ne Click Reactions

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• 作者：Haiyan Peng ; Chen Wang ; Weixian Xi ; Benjamin A Kowalski ; Tao Gong ; Xiaolin Xie ; Wentao Wang ; Devatha P. Nair ; Robert R. McLeod ; Christopher N. Bowman
• 刊名：Chemistry of Materials
• 出版年：2014
• 出版时间：December 9, 2014
• 年：2014
• 卷：26
• 期：23
• 页码：6819-6826
• 全文大小：462K
• ISSN：1520-5002

文摘

Freestanding substrates with high refractive index modulation, good oxygen resistance, and low volume shrinkage are critical in photolithography for the purpose of high density data storage, image patterning and anticounterfeiting. Herein, we demonstrate a novel paradigm of direct holographic image patterning via the radical-mediated thiol鈥搚ne click reaction subsequent to the base-catalyzed thiol-Michael addition reaction. With the benefit of a newly synthesized alkyne monomer, 9-(2-((2-(prop-2-yn-1-yloxy)ethyl)thio)ethyl)-9H-carbazole (POETEC), holograms with as high as 96% diffraction efficiency, refractive index modulation of 0.0036, dynamic range of 5.6 per 200 渭m and volume shrinkage of 1.1%, are successfully patterned in an aerobic environment. Uniquely and distinctly, an inhibitor is unnecessary to prevent the initiation of the sequential reaction in this framework.