Surface Energy Modification by Spin-Cast, Large-Area Graphene Film for Block Copolymer Lithography

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• 作者：Bong Hoon Kim ; Ju Young Kim ; Seong-Jun Jeong ; Jin Ok Hwang ; Duck Hyun Lee ; Dong Ok Shin ; Sung-Yool Choi ; Sang Ouk Kim
• 刊名：ACS Nano
• 出版年：2010
• 出版时间：September 28, 2010
• 年：2010
• 卷：4
• 期：9
• 页码：5464-5470
• 全文大小：538K
• 年卷期：0
• ISSN：1936-086X

文摘

We demonstrate a surface energy modification method exploiting graphene film. Spin-cast, atomic layer thick, large-area reduced graphene film successfully played the role of surface energy modifier for arbitrary surfaces. The degree of reduction enabled the tuning of the surface energy. Sufficiently reduced graphene served as a neutral surface modifier to induce surface perpendicular lamellae or cylinders in a block copolymer nanotemplate. Our approach integrating large-area graphene film preparation with block copolymer lithography is potentially advantageous in creating semiconducting graphene nanoribbons and nanoporous graphene.