Graphene Edge Lithography
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- 作者：Guibai Xie ; Zhiwen Shi ; Rong Yang ; Donghua Liu ; Wei Yang ; Meng Cheng ; Duoming Wang ; Dongxia Shi ; Guangyu Zhang
- 刊名：Nano Letters
- 出版年：2012
- 出版时间：September 12, 2012
- 年：2012
- 卷：12
- 期：9
- 页码：4642-4646
- 全文大小：314K
- 年卷期：v.12,no.9(September 12, 2012)
- ISSN：1530-6992
文摘
Fabrication of graphene nanostructures is of importance for both investigating their intrinsic physical properties and applying them into various functional devices. In this paper, we report a scalable fabrication approach for graphene nanostructures. Compared with conventional lithographic fabrication techniques, this new approach uses graphene edges as the templates or masks and offers advantage in technological simplicity and capability of creating small features below 10 nm scale. Moreover, mask layers used in the fabrication process could be simultaneously used as the dielectric layers for top-gated devices. The as-fabricated graphene nanoribbons (GNRs) are of high quality with the carrier mobility 400 cm2/(V s) for typical 15 nm wide ribbons. Our technique allows easy and reproducible fabrication of various graphene nanostructures, such as ribbons and rings, and can be potentially extended to other materials and systems by use of their edges or facets as templates.