Producing Small Domain Features Using Miktoarm Block Copolymers with Large Interaction Parameters

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• 作者：Weichao Shi ; Yuichi Tateishi ; Wei Li ; Craig J. Hawker ; Glenn H. Fredrickson ; Edward J. Kramer
• 刊名：ACS Macro Letters
• 出版年：2015
• 出版时间：November 17, 2015
• 年：2015
• 卷：4
• 期：11
• 页码：1287-1292
• 全文大小：492K
• ISSN：2161-1653

文摘

We demonstrate that small domain features (鈭?3 nm) can be obtained in a series of polystyrene (PS) and poly(lactic acid) (PLA) block copolymers, PS鈥?PLA)₂ and (PS)₂鈥?PLA)₂, that combine miktoarm molecular architectures with large interaction parameters. To supplement the experimental work, we used self-consistent field theory in tandem with the random phase approximation to explore and contrast the phase behavior of AB_n and A_nB_n types of miktoarm block copolymers. Specifically, AB₂ and A₂B₂ were found to be effective molecular architectures for inducing strong shifts in phase boundaries with copolymer composition and to simultaneously tune domain feature sizes. The performance of these systems is markedly different from the corresponding linear diblock copolymers and indicates the potential of macromolecular architecture control for future applications in lithography.