Creating Ligand-Free Silicon Germanium Alloy Nanocrystal Inks

详细信息    查看全文

• 作者：Folarin Erogbogbo ; Tianhang Liu ; Nithin Ramadurai ; Phillip Tuccarione ; Larry Lai ; Mark T. Swihart ; Paras N. Prasad
• 刊名：ACS Nano
• 出版年：2011
• 出版时间：October 25, 2011
• 年：2011
• 卷：5
• 期：10
• 页码：7950-7959
• 全文大小：1147K
• 年卷期：0
• ISSN：1936-086X

文摘

Particle size is widely used to tune the electronic, optical, and catalytic properties of semiconductor nanocrystals. This contrasts with bulk semiconductors, where properties are tuned based on composition, either through doping or through band gap engineering of alloys. Ideally, one would like to control both size and composition of semiconductor nanocrystals. Here, we demonstrate production of silicon–germanium alloy nanoparticles by laser pyrolysis of silane and germane. We have used FTIR, TEM, XRD, EDX, SEM, and TOF-SIMS to conclusively determine their structure and composition. Moreover, we show that upon extended sonication in selected solvents, these bare nanocrystals can be stably dispersed without ligands, thereby providing the possibility of using them as an ink to make patterned films, free of organic surfactants, for device fabrication. The engineering of these SiGe alloy inks is an important step toward the low-cost fabrication of group IV nanocrystal optoelectronic, thermoelectric, and photovoltaic devices.