Facile Route to NiO Nanostructured Electrode Grown by Oblique Angle Deposition Technique for Supercapacitors

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• 作者：Vasudevan Kannan ; Akbar I. Inamdar ; Sambaji M. Pawar ; Hyun-Seok Kim ; Hyun-Chang Park ; Hyungsang Kim ; Hyunsik Im ; Yeon Sik Chae
• 刊名：ACS Applied Materials & Interfaces
• 出版年：2016
• 出版时间：July 13, 2016
• 年：2016
• 卷：8
• 期：27
• 页码：17220-17225
• 全文大小：467K
• 年卷期：0
• ISSN：1944-8252

文摘

We report an efficient method for growing NiO nanostructures by oblique angle deposition (OAD) technique in an e-beam evaporator for supercapacitor applications. This facile physical vapor deposition technique combined with OAD presents a unique, direct, and economical route for obtaining high width-to-height ratio nanorods for supercapacitor electrodes. The NiO nanostructure essentially consists of nanorods with varying dimensions. The sample deposited at OAD 75° showed highest supercapacitance value of 344 F/g. NiO nanorod electrodes exhibits excellent electrochemical stability with no degradation in capacitance after 5000 charge–discharge cycles. The nanostructured film adhered well to the substrate and had 131% capacity retention. Peak energy density and power density of the NiO nanorods were 8.78 Wh/kg and 2.5 kW/kg, respectively. This technique has potential to be expanded for growing nanostructured films of other interesting metal/metal oxide candidates for supercapacitor applications.