Anisotropic Wettability on Imprinted Hierarchical Structures
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- 作者：Fengxiang Zhang ; Hong Yee Low
- 刊名：Langmuir
- 出版年：2007
- 出版时间：July 3, 2007
- 年：2007
- 卷：23
- 期：14
- 页码：7793 - 7798
- 全文大小：370K
- 年卷期：v.23,no.14(July 3, 2007)
- ISSN：1520-5827
文摘
A series of two-level hierarchical structures on polystyrene (PS) and poly(methyl methacrylate) (PMMA) werefabricated using sequential nanoimprinting lithography (NIL). The hierarchical structures consist of micrometer andsub-micrometer scale grating imprinted with varying orientations. Through water contact angle measurements, thesesurface hierarchical structures showed a wide range of anisotropic wettabilities on PMMA and PS, with PMMA havingan anisotropic wettability from 6
to 54 and PS having an anisotropic wettability from 8 to 32. At the same time,the water contact angle of PMMA and PS can be tuned to nearly 120 without modifying the surface chemistry. Atunable anisotropic wettability is beneficial for applications where controlling the direction of liquid flow is important,such as in microfluidic devices.
to 54 and PS having an anisotropic wettability from 8 to 32. At the same time,the water contact angle of PMMA and PS can be tuned to nearly 120 without modifying the surface chemistry. Atunable anisotropic wettability is beneficial for applications where controlling the direction of liquid flow is important,such as in microfluidic devices.