文摘
We demonstrate the unforeseen property of selective adhesion/delamination of amphiphilicblock copolymer films in coating hydrophobic and hydrophilic substrates. When spin-coated from THFsolutions onto hydrophilic substrates (e.g., glass and O3-treated silicon wafer), amphiphilic poly(oligoethylene glycol methyl ether methacrylate) (POEGMA)-based ABA block copolymers 1 and 2 formedthin films with hydrophobic surfaces. Upon exposure to water, these films undergo a fast rearrangementto a hydrophilic surface before they delaminate from the substrate. In contrast, when deposited on ahydrophobic substrate (e.g., Au, Si, Ag), the same copolymer films do not undergo any surfacerearrangement and remain as coherent thin films on the substrate. From contact angle measurementsit becomes clear that the delamination is accompanied by a rapid surface rearrangement from ahydrophobic to hydrophilic nature. This rearrangement is not observed for the copolymer over hydrophobicsurfaces despite the identical constitutions of the copolymers and identical microphase-separated surfacemorphologies. It is shown that within the range of polymers investigated this behavior was only observedfor POEGMA-containing triblock copolymers. Moreover, it is also shown that in order to show thisdelamination behavior the polar A-block must be large compared to the apolar B-block. On the basis ofXPS and AFM data, we propose that this selective adhesion/delamination is a direct consequence of theself-organization of the block copolymers in the polymer thin films.