FLPNO Nitroxide Radical Formation by a 1,1-Carboboration Route
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The 1-trimethylsilylethynyl-2-diarylphosphanylethynylbenzene substrates 7a7c, with the diarylphosphanyl groups = PPh2, P(o-tolyl)2, or P(mesityl)2, were reacted with the strong boron Lewis acid B(C6F5)3 at ambient conditions. The starting materials 7a and 7b, featuring rather small nucleophilic phosphanyl substituents, underwent selective 1,1-carboboration at the C≡C-PAr2 moiety, forming rather unreactive unsaturated vicinal P/B Lewis pairs 8a and 8b that show a relatively strong internal P···B Lewis base/Lewis acid interaction. In contrast, the PMes2 system 7c reacted with B(C6F5)3 by a reaction sequence which was initiated by 1,1-carboboration and involved tandem C6F5 and mesityl group migration to yield the unsaturated annulated P/B Lewis pair 9, featuring an electron-withdrawing C6F5 group at phosphorus. Compound 9 underwent cooperative P/B addition to the nitrogen atom of nitric oxide to give the persistent FLPNO? nitroxide radical 12. Radical 12 was characterized by electron spin resonance spectroscopy and by X-ray diffraction. It showed typical nitroxide radical reactions.

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