Controlled Chlorine Plasma Reaction for Noninvasive Graphene Doping

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• 作者：Justin Wu ; Liming Xie ; Yanguang Li ; Hailiang Wang ; Yijian Ouyang ; Jing Guo ; Hongjie Dai
• 刊名：Journal of the American Chemical Society
• 出版年：2011
• 出版时间：December 14, 2011
• 年：2011
• 卷：133
• 期：49
• 页码：19668-19671
• 全文大小：815K
• 年卷期：v.133,no.49(December 14, 2011)
• ISSN：1520-5126

文摘

We investigated the chlorine plasma reaction with graphene and graphene nanoribbons and compared it with the hydrogen and fluorine plasma reactions. Unlike the rapid destruction of graphene by hydrogen and fluorine plasmas, much slower reaction kinetics between the chlorine plasma and graphene were observed, allowing for controlled chlorination. Electrical measurements on graphene sheets, graphene nanoribbons, and large graphene films grown by chemical vapor deposition showed p-type doping accompanied by a conductance increase, suggesting nondestructive doping via chlorination. Ab initio simulations were performed to rationalize the differences in fluorine, hydrogen, and chlorine functionalization of graphene.