Simultaneous Electrochemical Reduction and Delamination of Graphene Oxide Films
详细信息 查看全文
- 作者：Xiaohan Wang ; Iskandar Kholmanov ; Harry Chou ; Rodney S. Ruoff
- 刊名：ACS Nano
- 出版年：2015
- 出版时间：September 22, 2015
- 年：2015
- 卷：9
- 期：9
- 页码：8737-8743
- 全文大小：458K
- ISSN：1936-086X
文摘
Here we report an electrochemical method to simultaneously reduce and delaminate graphene oxide (G-O) thin films deposited on metal (Al and Au) substrates. During the electrochemical reaction, interface charge transfer between the G-O thin film and the electrode surface was found to be important in eliminating oxygen-containing groups, yielding highly reduced graphene oxide (rG-O). In the meantime, hydrogen bubbles were electrochemically generated at the rG-O film/electrode interface, propagating the film delamination. Unlike other metal-based G-O reduction methods, the metal used here was either not etched at all (for Au) or etched a small amount (for Al), thus making it possible to reuse the substrate and lower production costs. The delaminated rG-O film exhibits a thickness-dependent degree of reduction: greater reduction is achieved in thinner films. The thin rG-O films having an optical transmittance of 90% (位 = 550 nm) had a sheet resistance of 6390 卤 447 惟/鈻?(ohms per square). rG-O-based stretchable transparent conducting films were also demonstrated.