Epitaxial Growth of CrO2 Thin Films on TiO2(110) Surfaces
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- 作者：Heather A. Bullen and Simon J. Garrett
- 刊名：Chemistry of Materials
- 出版年：2002
- 出版时间：January 2002
- 年：2002
- 卷：14
- 期：1
- 页码：243 - 248
- 全文大小：133K
- 年卷期：v.14,no.1(January 2002)
- ISSN：1520-5002
文摘
Chromium dioxide films on TiO2(110) single crystals have been grown by using chemicalvapor deposition. The average growth rate was ~1.8 nm·min-1. Powder X-ray diffractionindicated that the films were highly (110) textured. X-ray photoelectron spectroscopy showedthat the CrO2 films were continuous and no other chromium oxides were present. The CrO2films were composed of grains typically 200-300 nm in diameter and appeared consistentwith the rutile crystal structure. Atomic force microscopy suggested that the films wererelatively rough, with a root-mean-square roughness of ~114 nm for an 850 nm thick film.The resistivity at room temperature was found to be ~137 
·cm which decreased to ~16·cm at 5 K, consistent with metallic behavior. The films were ferromagnetic with a Curietemperature of 398 K.
·cm which decreased to ~16·cm at 5 K, consistent with metallic behavior. The films were ferromagnetic with a Curietemperature of 398 K.