Photoinduced Nitric Oxide Release from a Hindered Nitrobenzene Derivative by Two-Photon Excitation

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• 作者：Kazuhiro Hishikawa ; Hidehiko Nakagawa ; Toshiaki Furuta ; Kiyoshi Fukuhara ; Hiroki Tsumoto ; Takayoshi Suzuki ; Naoki Miyata
• 刊名：Journal of the American Chemical Society
• 出版年：2009
• 出版时间：June 10, 2009
• 年：2009
• 卷：131
• 期：22
• 页码：7488-7489
• 全文大小：116K
• 年卷期：v.131,no.22(June 10, 2009)
• ISSN：1520-5126

文摘

Here, we demonstrated photoinduced NO generation from a 2,6-dimethylnitrobenzene-based compound (Flu-DNB) via a two-photon excitation (TPE) process. After pulse laser irradiation to a solution of Flu-DNB, oxidation products of NO were observed. This is the first account of a non-nitrosyl-chelated metal ion containing NO donor which can be controlled by the TPE technique.