Nondestructive Characterization of the Structural Quality and Thickness of Large-Area Graphene on Various Substrates

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• 作者：Yu-Lun Liu ; Chen-Chieh Yu ; Keng-Te Lin ; En-Yun Wang ; Tai-Chi Yang ; Hsuen-Li Chen ; Chun-Wei Chen ; Cheng-Kai Chang ; Li-Chyong Chen ; Kuei-Hsien Chen
• 刊名：Analytical Chemistry
• 出版年：2014
• 出版时间：August 5, 2014
• 年：2014
• 卷：86
• 期：15
• 页码：7192-7199
• 全文大小：525K
• ISSN：1520-6882

文摘

We demonstrate an inspection technique, based on only one ellipsometric parameter, 唯, of spectroscopic ellipsometry (SE), for the rapid, simultaneous identification of both the structural quality and thicknesses of large-area graphene films. The measured 唯 spectra are strongly affected by changes in the out-of-plane absorption coefficients (伪_TM); they are also correlated to the ratio of the intensities of the D and G bands in Raman spectra of graphene films. In addition, the electronic transition state of graphene within the UV regime assists the characterization of the structural quality. We also demonstrated that the intensities and shifts of the signals in 唯 spectra allow clear identification of the structural qualities and thicknesses, respectively, of graphene films. Moreover, this 唯-based method can be further applied to graphene films coated on various substrates. In addition, mapping of the values of 唯 is a very convenient and useful means of rapidly characterizing both the structural quality and thickness of 2D materials at local areas. Therefore, this 唯-based characterization method has great potential for application in the mass production of devices based on large-area graphene.