文摘
Nanoelectronic memory based on trapped charge need to be small and fast, but fundamentally it faces a voltage鈥搕ime dilemma because the requirement of a high-energy barrier for data retention under zero/low electrical stimuli is incompatible with the demand of a low-energy barrier for fast switching under a modest programming voltage. One solution is to embed an atomic-level lever of localized electron鈥損honon interaction to autonomously reconfigure trap-site鈥檚 barrier in accordance to the electron-occupancy of the site. Here we demonstrate an atomically levered resistance-switching memory built on locally flexible amorphous nanometallic thin films: charge detrapping can be triggered by a mechanical force, the fastest one being a plasmonic Lorentz force induced by a nearby electron or positron bunch passing in 10鈥?3 s. The observation provided the first real-time evidence of an electron鈥損honon interaction in action, which enables nanometallic memory to turn on at a subpicosecond speed yet retain long-term memory, thus suitable for universal memory and other nanoelectron applications.
Keywords:
Resistive switching memory; amorphous materials; metal insulator transition; electron鈭抪honon interaction; plasmonic; pressure (effect)