Molecular Layer Deposition of Titanicone Films using TiCl4 and Ethylene Glycol or Glycerol: Growth and Properties
详细信息    查看全文
文摘
Molecular layer deposition (MLD) techniques were used to grow titanium-containing hybrid organic鈥搃norganic films known as 鈥渢itanicones鈥?using titanium tetrachloride (TiCl4) and either ethylene glycol (EG) or glycerol (GL). The surface chemistry for titanicone MLD was self-limiting versus TiCl4 and either EG or GL exposures. Quartz crystal microbalance (QCM) measurements observed a film growth rate of 83 ng/cm2/cycle using TiCl4 and EG from 90 to 115 掳C. The growth rate then decreased significantly at 135 掳C. X-ray reflectivity (XRR) studies yielded a growth rate of 4.5 脜/cycle with a constant density of 1.8 g/cm3 from 90 to 115 掳C. The growth rate measured using XRR also decreased to 1.5 脜/cycle at 135 掳C. Titanicone films were grown using TiCl4 and GL at higher temperatures between 130 and 210 掳C. GL should increase the bridging between the polymer chains in the titanicone film and change film properties and improve film stability. The film growth rates decreased with temperature from 49 ng/cm2/cycle at 130 掳C to 34 ng/cm2/cycle at 210 掳C. XRR studies were consistent with a temperature-dependent film growth and measured growth rates of 2.8 脜/cycle at 130 掳C and 2.1 脜/cycle at 210 掳C. Nanoindentation experiments revealed that the elastic modulus and hardness of the titanicone films grown using GL were much higher than titanicone films grown using EG. Annealing the titanicone films to 600 掳C in air removed the carbon constituents and yielded TiO2 films with a density of 3.3 g/cm3 that is slightly higher than the density of TiO2 ALD films grown at 115 掳C. The titanicone films absorbed light in the ultraviolet, and the absorption threshold was consistent with an optical bandgap of 3.6 eV. Prolonged ultraviolet exposures on the titanicone films produced TiO2 films with a low density of 2.7 g/cm3.

Keywords:

layer+deposition&qsSearchArea=searchText">molecular layer deposition; thin films; hybrid organic-inorganic; titanium oxide; layer+deposition&qsSearchArea=searchText">atomic layer deposition

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700