Photoelectrochemical Processes at n-GaAs(100)/Aqueous HCl Electrolyte Interface: A Synchrotron Photoemission Spectroscopy Study of Emersed Electrodes

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• 作者：Mikhail V. Lebedev ; Wolfram Calvet ; Thomas Mayer ; Wolfram Jaegermann
• 刊名：Journal of Physical Chemistry C
• 出版年：2014
• 出版时间：June 19, 2014
• 年：2014
• 卷：118
• 期：24
• 页码：12774-12781
• 全文大小：530K
• 年卷期：v.118,no.24(June 19, 2014)
• ISSN：1932-7455

文摘

High-resolution synchrotron photoemission spectroscopy has been applied to detail the electrochemical and photoelectrochemical corrosion reactions at the liquid junction n-GaAs(100)/1 M aqueous HCl solution. Under anodic polarization of 1.8 eV, the main process initiated by the presence of holes in the Ga鈥揂s bonding states of the valence band is the formation of soluble gallium chloride complexes and insoluble elemental arsenic on the surface. In addition, arsenic hydroxide forms, which reacts further to soluble HAsO₂. In toto, the As/Ga atomic ratio increases, which is accompanied by an increase of the work function. The anodic decomposition reaction is enhanced by illumination as more holes reach the n-semiconductor/electrolyte junction. Under cathodic polarization of 1.5 eV, only minor changes are observed in Ga and As core-level spectra, giving no indication of corrosion, but specific adsorption of hydrated HCl molecules and/or Cl^{鈥?/sup> ions considerably modifies valence band spectra.}