Fluorene Oxidation by Coupling of Ozone, Radiation, and Semiconductors: A Mathematical Approach to the Kinetics

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• 作者：F. Javier Rivas ; Fernando J. Beltrá ; n ; Olga Gimeno ; and Marí ; a Carbajo
• 刊名：Industrial & Engineering Chemistry Research
• 出版年：2006
• 出版时间：January 4, 2006
• 年：2006
• 卷：45
• 期：1
• 页码：166 - 174
• 全文大小：506K
• 年卷期：v.45,no.1(January 4, 2006)
• ISSN：1520-5045

文摘

The kinetics of fluorene oxidation by systems that include ozone (O₃), ozonation in the presence of titaniumdioxide (O₃/TiO₂), photolytic ozonation (O₃/UV-A), titanium dioxide photocatalysis (TiO₂/UV-A), and titaniumdioxide photocatalytic ozonation (UV-A/O₃/TiO₂) has been mathematically assessed by the proposal of amechanism based on experimental results. The conventional free-radical mechanism involved in ozone processeswas the starting point to model the different systems. Single fluorene ozonation simulation suggests the existenceof a hydroxyl radical source other than ozone activation through hydroxyl anions and/or the ionic form ofhydrogen peroxide. Combination of O₃ with TiO₂ or UV-A radiation involves a negligible effect in the firstcase and the improvement of the fluorene removal rate in the second case. In the latter process, ozone photolysislikely entails a higher formation of hydroxyl radicals. Because fluorene does not absorb UV-A light,photocatalytic oxidation of fluorene by the system TiO₂/UV-A also indicates the development of surfaceradical reactions. Finally, the photocatalytic ozonation of the polycyclic aromatic hydrocarbon implies asynergistic effect of the single systems.