Low-k Periodic Mesoporous Organosilica with Air Walls: POSS-PMO

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• 作者：Makoto Seino ; Wendong Wang ; Jennifer E. Lofgreen ; Daniel P. Puzzo ; Takao Manabe ; Geoffrey A. Ozin
• 刊名：Journal of the American Chemical Society
• 出版年：2011
• 出版时间：November 16, 2011
• 年：2011
• 卷：133
• 期：45
• 页码：18082-18085
• 全文大小：765K
• 年卷期：v.133,no.45(November 16, 2011)
• ISSN：1520-5126

文摘

Periodic mesoporous organosilica (PMO) with polyhedral oligomeric silsesquioxane (POSS) air pockets integrated into the pore walls has been prepared by a template-directed, evaporation-induced self-assembly spin-coating procedure to create a hybrid POSS-PMO thin film. A 10-fold increase in the porosity of the POSS-PMO film compared to a reference POSS film is achieved by incorporating 1.5 nm pores. The increased porosity results in a decrease in the dielectric constant, k, which goes from 2.03 in a reference POSS film to 1.73 in the POSS-PMO film.