Morphology Control in Block Copolymer Films Using Mixed Solvent Vapors
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- 作者：Kevin W. Gotrik ; Adam F. Hannon ; Jeong Gon Son ; Brent Keller ; Alfredo Alexander-Katz ; Caroline A. Ross
- 刊名：ACS Nano
- 出版年：2012
- 出版时间：September 25, 2012
- 年：2012
- 卷：6
- 期：9
- 页码：8052-8059
- 全文大小：496K
- 年卷期：v.6,no.9(September 25, 2012)
- ISSN：1936-086X
文摘
Solvent vapor annealing of block copolymer thin films can produce a range of morphologies different from the equilibrium bulk morphology. By systematically varying the flow rate of two different solvent vapors (toluene and n-heptane) and an inert gas, phase maps showing the morphology versus vapor pressure of the solvents were constructed for 45 kg/mol polystyrene-block-polydimethylsiloxane diblock copolymer films of different thicknesses. The final morphology was correlated with the swelling of the block copolymer and homopolymer films and the solvent vapor annealing conditions. Self-consistent field theory is used to model the effects of solvent swelling. These results provide a framework for predicting the range of morphologies available under different solvent vapor conditions, which is important in lithographic applications where precise control of morphology and critical dimensions are essential.