Large-Area Deposition of MoS2 by Pulsed Laser Deposition with In Situ Thickness Control

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• 作者：Martha I. Serna ; Seong H. Yoo ; Salvador Moreno ; Yang Xi ; Juan Pablo Oviedo ; Hyunjoo Choi ; Husam N. Alshareef ; Moon J. Kim ; Majid Minary-Jolandan ; Manuel A. Quevedo-Lopez
• 刊名：ACS Nano
• 出版年：2016
• 出版时间：June 28, 2016
• 年：2016
• 卷：10
• 期：6
• 页码：6054-6061
• 全文大小：591K
• 年卷期：0
• ISSN：1936-086X

文摘

A scalable and catalyst-free method to deposit stoichiometric molybdenum disulfide (MoS₂) films over large areas is reported, with the maximum area limited by the size of the substrate holder. The method allows deposition of MoS₂ layers on a wide range of substrates without any additional surface preparation, including single-crystal (sapphire and quartz), polycrystalline (HfO₂), and amorphous (SiO₂) substrates. The films are deposited using carefully designed MoS₂ targets fabricated with excess sulfur and variable MoS₂ and sulfur particle size. Uniform and layered MoS₂ films as thin as two monolayers, with an electrical resistivity of 1.54 × 10⁴ Ω cm^–1, were achieved. The MoS₂ stoichiometry was confirmed by high-resolution Rutherford backscattering spectrometry. With the method reported here, in situ graded MoS₂ films ranging from ∼1 to 10 monolayers can be deposited.