文摘
Block copolymer (BCP) lithography has generally been synonymous to one- or two-dimensional single layered lithographic templates as a means to fabricate simple nanoscaled structures. Recently, the rapidly increasing demand for complex nanostructures and the corresponding evolution in BCP lithography have led to three-dimensional (3D) BCP nanostructures, which can be fabricated in various ways such as directed self-assembly or stacking of cross-linked BCP patterns. This review covers the recent advances in the 3D multilayered structures from cross-linkable BCPs, which provide an easy and robust means for integrating various BCP structures into one scaffold. In this case, wetting-optimized adjustment of BCP microdomains at the layer interface plays a critical role in the formation of well-defined 3D multilayer nanostructures.