Sub-10 nm Thick Microporous Membranes Made by Plasma-Defined Atomic Layer Deposition of a Bridged Silsesquioxane Precursor

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• 作者：Ying-Bing Jiang ; George Xomeritakis ; Zhu Chen ; Darren Dunphy ; David J. Kissel ; Joseph L. Cecchi ; C. Jeffrey Brinker
• 刊名：Journal of the American Chemical Society
• 出版年：2007
• 出版时间：December 19, 2007
• 年：2007
• 卷：129
• 期：50
• 页码：15446 - 15447
• 全文大小：371K
• 年卷期：v.129,no.50(December 19, 2007)
• ISSN：1520-5126

文摘

We report atomic layer deposition of an ultrathin hybrid organic/inorganic film on a porous support and its conversion to a high flux, high selectivity membrane. Through chemical passivation of the internal support porosity and remote oxygen plasma activation of the support surface, ALD of a bis(triethoxysilyl)ethane precursor is confined to the immediate surface of the support, allowing formation of a 5 nm thick film spanning the underlying porosity. UV/ozone removal of the C₂ porogen creates a microporous membrane with a He/SF₆ selectivity >10⁴ and a substantial He flux of 5.3 sccm/bar·cm². Prior to conversion, these ultrathin films are of interest as low k dielectric sealing layers. Use of bridging ligands with other shapes and sizes should enable generalization of this approach to other demanding separation problems.