TaSi
2 nanowires have been synthesized on a Si substrate by annealing NiSi
2 films at 950
C in an ambient con
taining Ta vapor. The nanowirescould be grown up to 13
m in length. Field-emission measurements show that the turn-on field is low at 4-4.5 V/
m and the threshold fieldis down to 6 V/
m with the field enhancement factor as high as 1800. The me
tallic TaSi
2 nanowires exhibit excellent electrical properties witha remarkable high failure current density of 3 × 10
8 A cm
-2. In addition, effects of annealing temperatures and capability of me
tal silicidemediation layer on the growth of nanowires are addressed. This simple approach promises future applications in nanoelectronics and nano-optoelectronics.