TaSi2 Nanowires: A Potential Field Emitter and Interconnect
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文摘
TaSi2 nanowires have been synthesized on a Si substrate by annealing NiSi2 films at 950 C in an ambient containing Ta vapor. The nanowirescould be grown up to 13 m in length. Field-emission measurements show that the turn-on field is low at 4-4.5 V/m and the threshold fieldis down to 6 V/m with the field enhancement factor as high as 1800. The metallic TaSi2 nanowires exhibit excellent electrical properties witha remarkable high failure current density of 3 × 108 A cm-2. In addition, effects of annealing temperatures and capability of metal silicidemediation layer on the growth of nanowires are addressed. This simple approach promises future applications in nanoelectronics and nano-optoelectronics.

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