Photopatterned Polydiacetylene Images Using a DNA Bio-Photomask
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- 作者：Yun Kyung Jung ; Cheulhee Jung ; Hyun Gyu Park
- 刊名：ACS Applied Materials & Interfaces
- 出版年：2016
- 出版时间：June 22, 2016
- 年：2016
- 卷：8
- 期：24
- 页码：15684-15690
- 全文大小：347K
- 年卷期：0
- ISSN：1944-8252
文摘
We describe a novel strategy to fabricate a well-defined polydiacetylene (PDA) supramolecular pattern on polyvinylidene fluoride (PVDF) membrane utilizing a DNA bio-photomask. By focusing on that, the absorption spectrum of DNA molecules having a λmax at 260 nm overlaps with the wavelength at which the photopolymerization of the diacetylene monomer occurs, DNA molecules are used to define specific patterns on PVDF membranes coated with diacetylene lipids by shielding the applied 254 nm UV light and consequently preventing the photopolymerization of the lipids. As a result, the DNA-covered regions retain the original white color on the membrane while the regions uncovered by DNA molecules undergo the color change to blue through the photopolymerization by 254 nm UV irradiation. On the basis of the selective illumination through a DNA photomask, we precisely manufacture specific patterns using a microarray spotting method and also demonstrate the capability of this strategy to achieve a novel colorimetric DNA sensor without any complicated process.