3-Phenyl-3,3-ethylenedioxy-1-propyl Sulfonates as Acid Amplifiers To Enhance the Photosensitivity of Positive-Working Photoresists

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• 作者：Kazuaki Kudo ; Koji Arimitsu ; Hironori Ohmori ; Hiromitsu Ito ; and Kunihiro Ichimura
• 刊名：Chemistry of Materials
• 出版年：1999
• 出版时间：August 1999
• 年：1999
• 卷：11
• 期：8
• 页码：2119 - 2125
• 全文大小：85K
• 年卷期：v.11,no.8(August 1999)
• ISSN：1520-5002

文摘

In the presence of a small amount of acid, 3-phenyl-3,3-ethylenedioxy-1-propyl p-toluenesulfonate autocatalytically decomposed to give p-toluenesulfonic acid both in solutionand in a polymer matrix. Such a reaction was successfully applied for the improvement ofsensitivity of several positive-working chemical-amplification photoresists. It was revealedthat the diffusion of the acid plays the most essential role in the sensitivity enhancement,by determining the addition effect of the acid amplifiers with various arenesulfonates onphotosensitivity characteristics.