Acid Proliferation Processes of 3-Phenyl-3,3-ethylenedioxypropyl Sulfonates in Photosensitive Polymer Films Leading to "Air Infection"

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• 作者：Kazuaki Kudo ; Koji Arimitsu ; Hironori Ohmori ; Hiromitsu Ito ; and Kunihiro Ichimura
• 刊名：Chemistry of Materials
• 出版年：1999
• 出版时间：August 1999
• 年：1999
• 卷：11
• 期：8
• 页码：2126 - 2131
• 全文大小：105K
• 年卷期：v.11,no.8(August 1999)
• ISSN：1520-5002

文摘

The thickness of UV-irradiated films of poly[p-(tert-butoxycarbonyloxy)styrene] and poly(tert-butyl methacrylate) containing a photoacid generator as a chemically amplifiedphotoresist was reduced by the deprotection of the side chain residues as a result of theacidolysis reaction catalyzed by a photogenerated acidic species. It was observed that thereduction of film thickness is spread laterally on a millimeter scale to unexposed areas uponheating in the presence of 3-phenyl-3,3-ethylenedioxy-1-propyl p-toluenesulfonate as an acidamplifier that displays the autocatalytic acidolysis referred to as acid proliferation. Theenlargement of areas showing the thickness reduction was suppressed effectively by coveringthe films with a glass plate or a polymer film. This observation suggested that the acidolysisreaction of the films is caused predominantly by the migration of acid molecules originatedfrom the acid amplifier through the air. This was confirmed by the transfer of acid moleculesto another acid-sensitive polymer layer placed on the acid-generating film through an airgap. The photosensitivity enhancement of the chemically amplified photoresists owing tothe acid proliferation is discussed on the basis of these results.