Oxidative Reactions of Silicon Atoms and Clusters at Ultralow Temperature in Helium Droplets
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- 作者：Serge A. Krasnokutski ; Friedrich Huisken
- 刊名：Journal of Physical Chemistry A
- 出版年：2010
- 出版时间：December 23, 2010
- 年：2010
- 卷：114
- 期：50
- 页码：13045-13049
- 全文大小：204K
- 年卷期：v.114,no.50(December 23, 2010)
- ISSN：1520-5215
文摘
The reaction between Si and O2 was studied in liquid He droplets at low temperature (T = 0.37 K) by monitoring the energy release during the reaction. Additionally, the reactions of Si atoms and clusters with the oxidation agents H2O and O2 have been studied by mass spectrometry. It was found that Si atoms react fast with O2 molecules. On the other hand, Si atoms and clusters do not react with H2O molecules. The energy released during the chemical reaction leads to the ejection of the products from small He droplets. In contrast, large He droplets (NHe > 20000) are capable of keeping part of the reaction products in their interior. The observation of SiO2 products with the mass spectrometer reveals that the He droplet can stabilize intermediate products in the exit channel.