Nanotransfer Printing Using Plasma Etched Silicon Stamps and Mediated by in Situ Deposited Fluoropolymer

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• 作者：Deepak Bhandari ; Ivan I. Kravchenko ; Nickolay V. Lavrik ; Michael J. Sepaniak
• 刊名：Journal of the American Chemical Society
• 出版年：2011
• 出版时间：May 25, 2011
• 年：2011
• 卷：133
• 期：20
• 页码：7722-7724
• 全文大小：717K
• 年卷期：v.133,no.20(May 25, 2011)
• ISSN：1520-5126

文摘

This communication describes a simple method that uses a thin film of octafluorocyclobutane (OFCB) polymer for efficient nanoscale transfer printing (nTP). Plasma polymerization of OFCB produces a Teflon-like fluoropolymer which strongly adheres and conformally covers a 3-D inorganic stamp. The inherently low surface energy of in situ deposited OFCB polymer on nanoscale silicon features is demonstrated as a unique nanocomposite stamp to fabricate various test structures with improved nTP feature resolution down to sub-100 nm.