Controlled DNA Patterning by Chemical Lift-Off Lithography: Matrix Matters
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- 作者：Huan H. Cao ; Nako Nakatsuka ; Andrew C. Serino ; Wei-Ssu Liao ; Sarawut Cheunkar ; Hongyan Yang ; Paul S. Weiss ; Anne M. Andrews
- 刊名：ACS Nano
- 出版年：2015
- 出版时间：November 24, 2015
- 年：2015
- 卷：9
- 期：11
- 页码：11439-11454
- 全文大小：1039K
- ISSN：1936-086X
文摘
Nucleotide arrays require controlled surface densities and minimal nucleotide鈥搒ubstrate interactions to enable highly specific and efficient recognition by corresponding targets. We investigated chemical lift-off lithography with hydroxyl- and oligo(ethylene glycol)-terminated alkanethiol self-assembled monolayers as a means to produce substrates optimized for tethered DNA insertion into post-lift-off regions. Residual alkanethiols in the patterned regions after lift-off lithography enabled the formation of patterned DNA monolayers that favored hybridization with target DNA. Nucleotide densities were tunable by altering surface chemistries and alkanethiol ratios prior to lift-off. Lithography-induced conformational changes in oligo(ethylene glycol)-terminated monolayers hindered nucleotide insertion but could be used to advantage via mixed monolayers or double-lift-off lithography. Compared to thiolated DNA self-assembly alone or with alkanethiol backfilling, preparation of functional nucleotide arrays by chemical lift-off lithography enables superior hybridization efficiency and tunability.