Fabrication of a Photocontrolled Surface with Switchable Wettability Based on Host鈥揋uest Inclusion Complexation and Protein Resistance

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• 作者：Qiongxia Shen ; Lichao Liu ; Weian Zhang
• 刊名：Langmuir
• 出版年：2014
• 出版时间：August 12, 2014
• 年：2014
• 卷：30
• 期：31
• 页码：9361-9369
• 全文大小：421K
• ISSN：1520-5827

文摘

A novel surface-modification strategy has been developed for the construction of a photocontrolled silicon wafer surface with switchable wettability based on host鈥揼uest inclusion complexation. The silicon wafer was first modified by guest molecule azobenzene (Azo) via a silanization reaction. Subsequently, a series of polymers with different polarities were attached to host molecule 尾-cyclodextrin (尾-CD) to prepare 尾-CD-containing hemitelechelic polymers via click chemistry. Finally, a photocontrolled silicon wafer surface modified with polymers was fabricated by inclusion complexation between 尾-CD and Azo, and the surface properties of the substrate are dependent on the polymers we used. The elemental composition, surface morphology, and hydrophilic/hydrophobic property of the modified surfaces were characterized by X-ray photoelectron spectroscopy (XPS), atomic force microscope, and contact angle measurements, respectively. The antifouling property of the PEG-functionalized surface was evaluated by a protein adsorption assay using bovine serum albumin, which was also characterized by XPS. The results demonstrate that the surface modified with PEG possesses good protein-resistant properties.